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Effect of substrate temperature on deposition rate of rf plasma-deposited hydrogenated amorphous silicon thin films
Andújar Bella, José Luis; Bertran Serra, Enric; Canillas i Biosca, Adolf; Campmany i Guillot, Josep, 1966-; Morenza Gil, José Luis
Universitat de Barcelona
2012-10-09
Pel·lícules fines
Silici
Semiconductors amorfs
Thin films
Silicon
Amorphous semiconductors
(c) American Institute of Physics , 1991
Article
Article - Published version
American Institute of Physics
         

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