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RECERCAT Home > Universitat de Barcelona > Física Aplicada i Òptica > Articles publicats en revistes (Física Aplicada i Òptica) > View document

To access the full text documents, please follow this link: http://hdl.handle.net/2445/24793

dc.contributor Universitat de Barcelona
dc.contributor.author Viera Mármol, Gregorio
dc.contributor.author Huet, S.
dc.contributor.author Bertrán Serra, Enric
dc.contributor.author Boufendi, L.
dc.date 2012-05-03T07:23:35Z
dc.date 2012-05-03T07:23:35Z
dc.date 2001-10-15
dc.date.accessioned 2012-05-03T22:12:16Z
dc.date.available 2012-05-03T22:12:16Z
dc.date.issued 2012-05-03T22:12:16Z
dc.identifier.citation 0021-8979
dc.identifier.citation http://dx.doi.org/10.1063/1.1398066
dc.identifier.uri http://hdl.handle.net/2445/24793
dc.format 9 p.
dc.format application/pdf
dc.language.iso eng
dc.publisher American Institute of Physics
dc.relation Reproducció del document publicat a: http://dx.doi.org/10.1063/1.1398066
dc.relation Journal of Applied Physics, 2001, vol. 90, núm. 8, p. 4272-4280
dc.rights (c) American Institute of Physics, 2001
dc.rights info:eu-repo/semantics/openAccess
dc.subject Pel·lícules fines
dc.subject Espectroscòpia Raman
dc.subject Nanoestructures
dc.subject Microelectrònica
dc.subject Radiofreqüència
dc.subject Optoelectrònica
dc.subject Thin films
dc.subject Raman spectroscopy
dc.subject Nanostructures
dc.subject Microelectronics
dc.subject Radio frequency
dc.subject Optoelectronics
dc.title Polymorphous Si thin films from radio frequency plasmas of SiH4 diluted in Ar: A study by transmission electron microscopy and Raman spectroscopy
dc.type info:eu-repo/semantics/article
dc.description.abstract

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Atomic structure of the nanocrystalline Si particles appearing in nanostructured Si thin films produced in low-temperature radiofrequency plasmas (Publication date: 2012-05-03)
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Production of nanometric particles in radio frequency glow discharges in mixtures of silane and methane (Publication date: 2012-05-08)
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Effect of the nanoparticles on the structure and crystallization of amorphous silicon thin films produced by rf glow discharge (Publication date: 2011-07-26)
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Particle agglomeration study in rf silane plasmas: In situ study by polarization-sensitive laser light scattering (Publication date: 2012-10-09)
Courteille, C.; Hollenstein, Ch.; Dorier, J. L.; Gay, P.; Schwarzenbach, W.; Howling, A. A.; Bertrán Serra, Enric; Viera Mármol, Gregorio; Martins, R.; Macarico, A.
Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applications (Publication date: 2012-03-19)
Bertrán Serra, Enric; Costa i Balanzat, Josep; Viera Mármol, Gregorio; Andújar Bella, José Luis; Canillas i Biosca, Adolf; Pascual Miralles, Esther
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